Invention Grant
- Patent Title: Nanowire transistor and method for fabricating the same
- Patent Title (中): 纳米线晶体管及其制造方法
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Application No.: US13399521Application Date: 2012-02-17
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Publication No.: US08368049B2Publication Date: 2013-02-05
- Inventor: Takahiro Kawashima , Tohru Saitoh , Kenji Harada , Norishige Nanai , Takayuki Takeuchi
- Applicant: Takahiro Kawashima , Tohru Saitoh , Kenji Harada , Norishige Nanai , Takayuki Takeuchi
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-093760 20060330
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00

Abstract:
A nanowire transistor according to the present invention includes: at least one nanowire 13 including a core portion 13a that functions as a channel region and an insulating shell portion 13b that covers the surface of the core portion 13a; source and drain electrodes 14 and 15, which are connected to the nanowire 13; and a gate electrode 21 for controlling conductivity in at least a part of the core portion 13a of the nanowire 13. The core portion 13a is made of semiconductor single crystals including Si and has a cross section with a curved profile on a plane that intersects with the longitudinal axis thereof. The insulating shell portion 13b is made of an insulator including Si and functions as at least a portion of a gate insulating film.
Public/Granted literature
- US20120156833A1 NANOWIRE TRANSISTOR AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-06-21
Information query
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