Invention Grant
- Patent Title: Ceramic plasma reactor and reaction apparatus
- Patent Title (中): 陶瓷等离子体反应器和反应装置
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Application No.: US12351210Application Date: 2009-01-09
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Publication No.: US08367966B2Publication Date: 2013-02-05
- Inventor: Michio Takahashi , Hiroshi Mizuno , Masaaki Masuda
- Applicant: Michio Takahashi , Hiroshi Mizuno , Masaaki Masuda
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Oliff & Berridge, PLC
- Priority: JP2008-007181 20080116
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
The ceramic plasma reactor includes: a plurality of unit electrodes each of which comprises a plate-shaped ceramic dielectric body 4 and a conductive film 3 embedded in the ceramic dielectric body superimposing them each other with a gap which works as a discharge portion 11, and preferably being formed by sandwiching one unit electrode 2b having no through holes 15 by two unit electrodes having plural through holes 2a there between. A partition wall plate 9 is provided by facing one of unit electrodes on a side opposite to the gap and being held by a holding member 7 at a predetermined distance so as to form there between a gas introducing-circulating portion 21 for introducing and circulating gas in the through-holes 15 so as to send gas introduced to the gap between the unit electrodes as a discharge portion by applying a voltage thereto to generate plasma.
Public/Granted literature
- US20090179545A1 CERAMIC PLASMA REACTOR AND REACTION APPARATUS Public/Granted day:2009-07-16
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