Invention Grant
- Patent Title: Method in depositing metal oxide materials
- Patent Title (中): 沉积金属氧化物材料的方法
-
Application No.: US12663782Application Date: 2008-07-02
-
Publication No.: US08367561B2Publication Date: 2013-02-05
- Inventor: Jarmo Maula , Kari Harkonen
- Applicant: Jarmo Maula , Kari Harkonen
- Applicant Address: FI Vantaa
- Assignee: Beneq Oy
- Current Assignee: Beneq Oy
- Current Assignee Address: FI Vantaa
- Agency: Oliff & Berridge, PLC
- Priority: EP07397023 20070703
- International Application: PCT/FI2008/050403 WO 20080702
- International Announcement: WO2009/004117 WO 20090108
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/00 ; H01L21/8242 ; H01L21/469 ; H01L21/44
Abstract:
The present invention relates to a method for enhancing uniformity of metal oxide coatings formed by Atomic Layer Deposition (ALD) or ALD-type processes. Layers are formed using alternating pulses of metal halide and oxygen-containing precursors, preferably water, and purging when necessary. An introduction of modificator pulses following the pulses of the oxygen-containing precursor affects positively on layer uniformity, which commonly exhibits gradients, particularly in applications with closely arranged substrates. In particular, improvement in layer thickness uniformity is obtained. According to the invention, alcohols having one to three carbon atoms can be used as the modificator.
Public/Granted literature
- US20100167555A1 METHOD IN DEPOSITING METAL OXIDE MATERIALS Public/Granted day:2010-07-01
Information query
IPC分类:
