Invention Grant
- Patent Title: Rapid patterning of nanostructures
- Patent Title (中): 纳米结构的快速图案化
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Application No.: US12692610Application Date: 2010-01-23
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Publication No.: US08367525B2Publication Date: 2013-02-05
- Inventor: Joseph M. Jacobson , Jae-bum Joo , Jon Varsanik , Vikrant Agnihotri
- Applicant: Joseph M. Jacobson , Jae-bum Joo , Jon Varsanik , Vikrant Agnihotri
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agent Norma E. Henderson
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/31
Abstract:
A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
Public/Granted literature
- US20100144125A1 Rapid Patterning of Nanostructures Public/Granted day:2010-06-10
Information query
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