Invention Grant
- Patent Title: Method for manufacturing semiconductor light-emitting device and semiconductor light emitting device
- Patent Title (中): 半导体发光元件及半导体发光元件的制造方法
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Application No.: US12726452Application Date: 2010-03-18
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Publication No.: US08367523B2Publication Date: 2013-02-05
- Inventor: Yoshiaki Sugizaki , Akihiro Kojima , Masanobu Ando , Kazuyoshi Furukawa
- Applicant: Yoshiaki Sugizaki , Akihiro Kojima , Masanobu Ando , Kazuyoshi Furukawa
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Turocy & Watson, LLP
- Priority: JP2009-220435 20090925
- Main IPC: H01L21/46
- IPC: H01L21/46 ; H01L21/00

Abstract:
A method for manufacturing a semiconductor light-emitting device of the invention includes: forming a semiconductor layer including a light-emitting layer and a first interconnect layer on a major surface of a temporary substrate; dividing the semiconductor layer and the first interconnect layer into a plurality of chips by a trench; collectively bonding each divided portion of the first interconnect layer of a plurality of chips to be bonded not adjacent to each other out of the plurality of chips on the temporary substrate to a second interconnect layer while opposing the major surface of the temporary substrate and the major surface of a supporting substrate forming the second interconnect layer, and collectively transferring a plurality of the bonded chips from the temporary substrate to the supporting substrate after irradiating interfaces between the bonded chips and the temporary substrate and separating the chips and the temporary substrate from each other.
Public/Granted literature
- US20110073890A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2011-03-31
Information query
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