Invention Grant
- Patent Title: Epitaxial lift off stack having a multi-layered handle and methods thereof
- Patent Title (中): 具有多层手柄的外延提升堆叠及其方法
-
Application No.: US12475420Application Date: 2009-05-29
-
Publication No.: US08367518B2Publication Date: 2013-02-05
- Inventor: Thomas Gmitter , Gang He
- Applicant: Thomas Gmitter , Gang He
- Applicant Address: US CA Santa Clara
- Assignee: Alta Devices, Inc.
- Current Assignee: Alta Devices, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/46

Abstract:
Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods for forming such films and devices. In one embodiment, a method for forming an ELO thin film includes depositing an epitaxial material over a sacrificial layer on a substrate, adhering a multi-layered support handle onto the epitaxial material, and removing the sacrificial layer during an etching process. The etching process further includes peeling the epitaxial material from the substrate and forming an etch crevice therebetween while maintaining compression in the epitaxial material. The method further provides that the multi-layered support handle contains a stiff support layer adhered to the epitaxial material, a soft support layer adhered to the stiff support layer, and a handle plate adhered to the soft support layer. In one example, the stiff support layer may contain multiple inorganic layers, such as metal layers, dielectric layers, or combinations thereof.
Public/Granted literature
- US20100001374A1 EPITAXIAL LIFT OFF STACK HAVING A MULTI-LAYERED HANDLE AND METHODS THEREOF Public/Granted day:2010-01-07
Information query
IPC分类: