Invention Grant
US08367480B2 Semiconductor device and method of forming dam material around periphery of die to reduce warpage
有权
半导体装置及在模具周边形成坝体材料以减少翘曲的方法
- Patent Title: Semiconductor device and method of forming dam material around periphery of die to reduce warpage
- Patent Title (中): 半导体装置及在模具周边形成坝体材料以减少翘曲的方法
-
Application No.: US13223478Application Date: 2011-09-01
-
Publication No.: US08367480B2Publication Date: 2013-02-05
- Inventor: Reza A. Pagaila
- Applicant: Reza A. Pagaila
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins & Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A semiconductor device has a carrier. A first semiconductor die is mounted to the carrier with an active surface of the first semiconductor die oriented toward the carrier. A dam structure is formed on the carrier and around the first semiconductor die by depositing dam material on the carrier with screen printing, electrolytic plating, electroless plating, or spray coating. An encapsulant is deposited over the carrier and around the first semiconductor die. The encapsulant has a coefficient of thermal expansion (CTE) that corresponds to a CTE of the dam material. The CTE of the dam material is equal to or less than the CTE of the encapsulant. The carrier is removed to expose the active surface of the first semiconductor die with the dam structure stiffening a periphery of the first semiconductor die. The semiconductor device is singulated through the dam structure.
Public/Granted literature
- US20110309488A1 Semiconductor Device and Method of Forming Dam Material Around Periphery of Die to Reduce Warpage Public/Granted day:2011-12-22
Information query
IPC分类: