Invention Grant
- Patent Title: Method of manufacturing magnetoresistive device and apparatus for manufacturing the same
- Patent Title (中): 制造磁阻装置的方法及其制造装置
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Application No.: US13177237Application Date: 2011-07-06
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Publication No.: US08367156B2Publication Date: 2013-02-05
- Inventor: Yoshinori Nagamine , Koji Tsunekawa , David Djulianto Djayaprawira , Hiroki Maehara
- Applicant: Yoshinori Nagamine , Koji Tsunekawa , David Djulianto Djayaprawira , Hiroki Maehara
- Applicant Address: JP Kawasaki-Shi
- Assignee: Canon Anelva Corporation
- Current Assignee: Canon Anelva Corporation
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2006-058748 20060303; JP2007-034686 20070215
- Main IPC: B05D5/12
- IPC: B05D5/12

Abstract:
A magnetoresistive device has an MgO (magnesium oxide) layer provided between a first ferromagnetic layer and a second ferromagnetic layer. The device is manufactured by forming a film of the MgO layer in a film forming chamber. A substance whose getter effect with respect to an oxidizing gas is large is adhered to surfaces of components provided in the chamber for forming the MgO layer. The substance having a large getter effect is a substance whose value of oxygen gas adsorption energy is 145 kcal/mol or higher. Ta (tantalum), in particular, is preferable as a substance which constitutes the magnetoresistive device.
Public/Granted literature
- US20110262634A1 METHOD OF MANUFACTURING MAGNETORESISTIVE DEVICE AND APPARATUS FOR MANUFACTURING THE SAME Public/Granted day:2011-10-27
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