Invention Grant
- Patent Title: Method for manufacturing cobalt alloy-based ceramic composite sputtering target
- Patent Title (中): 制造钴合金陶瓷复合溅射靶的方法
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Application No.: US12939174Application Date: 2010-11-04
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Publication No.: US08366994B2Publication Date: 2013-02-05
- Inventor: Rong-Zhi Chen , Chun-Hao Chiu , Jui-Tung Chang , Deng-Far Hsu , Chih-Huang Lai
- Applicant: Rong-Zhi Chen , Chun-Hao Chiu , Jui-Tung Chang , Deng-Far Hsu , Chih-Huang Lai
- Applicant Address: TW Kaohsiung
- Assignee: China Steel Corporation
- Current Assignee: China Steel Corporation
- Current Assignee Address: TW Kaohsiung
- Agency: CKC & Partners Co., Ltd.
- Priority: TW99109667A 20100330
- Main IPC: C22C32/00
- IPC: C22C32/00

Abstract:
A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.
Public/Granted literature
- US20110241253A1 METHOD FOR MANUFACTURING COBALT ALLOY-BASED CERAMIC COMPOSITE SPUTTERING TARGET Public/Granted day:2011-10-06
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