Invention Grant
US08351682B2 X-ray examination region setting method, X-ray examination apparatus and X-ray examination region setting program
有权
X线检查区域设定方法,X光检查装置及X线检查区域设定程序
- Patent Title: X-ray examination region setting method, X-ray examination apparatus and X-ray examination region setting program
- Patent Title (中): X线检查区域设定方法,X光检查装置及X线检查区域设定程序
-
Application No.: US12649984Application Date: 2009-12-30
-
Publication No.: US08351682B2Publication Date: 2013-01-08
- Inventor: Hideyuki Hayashi , Kunio Yoshida , Kiyoshi Murakami
- Applicant: Hideyuki Hayashi , Kunio Yoshida , Kiyoshi Murakami
- Applicant Address: JP Kyoto
- Assignee: Omron Corporation
- Current Assignee: Omron Corporation
- Current Assignee Address: JP Kyoto
- Agency: Foley & Lardner LLP
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
This invention enables information on a connection wiring with a substrate of a mounted component to be accurately and easily inputted in an X-ray examination apparatus. In teaching of a substrate examination, when a user inputs a two-dimensional region of a component to be examined with respect to a visible light image of the substrate, three-dimensional data is generated for the relevant region, which data is then analyzed to acquire a center coordinate, the number, the number of rows, and the number of columns on a ball terminal connecting the component to the substrate. Results such as the center coordinate acquired in such a manner may be displayed. The visible light image for the substrate is displayed in a display field of a screen. In the display field, a frame corresponding to a region acquired as an examination target is displayed in accordance with the visible light image, and a frame corresponding to each solder ball is displayed based on a position and the like of the solder ball acquired based on the three-dimensional data.
Public/Granted literature
Information query