Invention Grant
- Patent Title: Optical system, exposure system, and exposure method
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Application No.: US12656639Application Date: 2010-02-05
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Publication No.: US08351021B2Publication Date: 2013-01-08
- Inventor: Yasuhiro Omura
- Applicant: Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-018226 20040127; JP2004-338749 20041124
- Main IPC: G02B27/28
- IPC: G02B27/28 ; G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/72

Abstract:
An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
Public/Granted literature
- US20100142051A1 Optical system, exposure system, and exposure method Public/Granted day:2010-06-10
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