Invention Grant
US08258571B2 MOS semiconductor memory device having charge storage region formed from stack of insulating films
有权
具有由堆叠的绝缘膜形成的电荷存储区域的MOS半导体存储器件
- Patent Title: MOS semiconductor memory device having charge storage region formed from stack of insulating films
- Patent Title (中): 具有由堆叠的绝缘膜形成的电荷存储区域的MOS半导体存储器件
-
Application No.: US12665534Application Date: 2008-06-20
-
Publication No.: US08258571B2Publication Date: 2012-09-04
- Inventor: Tetsuo Endoh , Masayuki Kohno , Tatsuo Nishita , Minoru Honda , Toshio Nakanishi , Yoshihiro Hirota
- Applicant: Tetsuo Endoh , Masayuki Kohno , Tatsuo Nishita , Minoru Honda , Toshio Nakanishi , Yoshihiro Hirota
- Applicant Address: JP Tokyo JP Sendai-shi
- Assignee: Tokyo Electron Limited,Tohoku University
- Current Assignee: Tokyo Electron Limited,Tohoku University
- Current Assignee Address: JP Tokyo JP Sendai-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-164371 20070621; JP2008-092420 20080331
- International Application: PCT/JP2008/061679 WO 20080620
- International Announcement: WO2008/156215 WO 20081224
- Main IPC: H01L29/792
- IPC: H01L29/792

Abstract:
The invention provides a MOS semiconductor memory device that achieves excellent data retention characteristics while also achieving high-speed data write performance, low-power operation performance, and high reliability. A MOS semiconductor memory device 601 includes a first insulating film 111 and fifth insulating film 115 having large bandgaps 111a and 115a, a third insulating film 113 having the smallest bandgap 113a, and a second insulating film 112 and fourth insulating film 114 interposed between the third insulating film 113 and the first and fifth insulating films 111 and 115, respectively, and having intermediate bandgaps 112a and 114a.
Public/Granted literature
- US20100283097A1 MOS SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2010-11-11
Information query
IPC分类: