Invention Grant
- Patent Title: Nonvolatile memory device and method for manufacturing same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12726720Application Date: 2010-03-18
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Publication No.: US08258494B2Publication Date: 2012-09-04
- Inventor: Hiroyuki Fukumizu
- Applicant: Hiroyuki Fukumizu
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-75252 20090325
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L29/06

Abstract:
A nonvolatile memory device, includes: a lower side electrode aligned in a first direction; an upper side electrode positioned above the lower side electrode and aligned in a second direction intersecting the first direction; and a memory unit provided between the lower side electrode and the upper side electrode. At least one selected from the lower side electrode and the upper side electrode includes a first electrode and a second electrode, the first electrode having a forward-tapered side wall, the second electrode having a reverse-tapered side wall and being adjacent to the first electrode via an insulating layer in substantially identical plane.
Public/Granted literature
- US20100244248A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2010-09-30
Information query
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