Invention Grant
US08258201B2 Photocurable composition and process for producing molded product having fine pattern on its surface
有权
可光固化组合物及其表面上具有精细图案的成型体的制造方法
- Patent Title: Photocurable composition and process for producing molded product having fine pattern on its surface
- Patent Title (中): 可光固化组合物及其表面上具有精细图案的成型体的制造方法
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Application No.: US12888936Application Date: 2010-09-23
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Publication No.: US08258201B2Publication Date: 2012-09-04
- Inventor: Yasuhide Kawaguchi
- Applicant: Yasuhide Kawaguchi
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-140764 20080529
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08J3/28

Abstract:
To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).
Public/Granted literature
- US20110020617A1 PHOTOCURABLE COMPOSITION AND PROCESS FOR PRODUCING MOLDED PRODUCT HAVING FINE PATTERN ON ITS SURFACE Public/Granted day:2011-01-27
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