Invention Grant
- Patent Title: Ferroelectric random access memory device
- Patent Title (中): 铁电随机存取存储器件
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Application No.: US12562051Application Date: 2009-09-17
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Publication No.: US08238137B2Publication Date: 2012-08-07
- Inventor: Daisuke Hashimoto , Daisaburo Takashima
- Applicant: Daisuke Hashimoto , Daisaburo Takashima
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2008-283088 20081104
- Main IPC: G11C11/22
- IPC: G11C11/22

Abstract:
A ferroelectric random access memory device has a first bit line, a first ferroelectric capacitor, a second bit line, a second ferroelectric capacitor and a first to fourth MOS transistor. The first bit line is changed to a first data potential according to first data stored in the first ferroelectric capacitor, the second bit line is changed to a second data potential according to second data obtained by inverting a logic of the first data, and then the second MOS transistor and the fourth MOS transistor are turned on.
Public/Granted literature
- US20100110755A1 FERROELECTRIC RANDOM ACCESS MEMORY DEVICE Public/Granted day:2010-05-06
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