Invention Grant
- Patent Title: Hologram medium manufacturing method, master hologram medium manufacturing method, recording medium, and hologram medium manufacturing apparatus
- Patent Title (中): 全息图介质制造方法，主全息图介质制造方法，记录介质和全息图介质制造装置
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Application No.: US12328226Application Date: 2008-12-04
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Publication No.: US08238005B2Publication Date: 2012-08-07
- Inventor: Hisayuki Yamatsu , Kunihiko Hayashi , Norihiro Tanabe
- Applicant: Hisayuki Yamatsu , Kunihiko Hayashi , Norihiro Tanabe
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-317399 20071207
- Main IPC: G03H1/20
- IPC: G03H1/20 ; G03H1/22 ; G03H1/04
Abstract:
A hologram medium manufacturing method that includes disposing a first pair of master hologram media with a predetermined interval so that the first pair of the master hologram media face each other; forming a master hologram in the master hologram media by irradiating the first pair of the master hologram media with spherical wave light and reference light so that the spherical wave light and the reference light interfere with each other in the master hologram media. The spherical wave light and the reference light have a focal point between the first pair of the master hologram media. The method also includes disposing a hologram medium between the first pair of the master hologram media; and forming a hologram in the hologram medium by irradiating the first pair of the master hologram media with the reference light.
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