Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12711908Application Date: 2010-02-24
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Publication No.: US08237196B2Publication Date: 2012-08-07
- Inventor: Wataru Saito
- Applicant: Wataru Saito
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2009-61209 20090313
- Main IPC: H01L31/0328
- IPC: H01L31/0328

Abstract:
A semiconductor device includes: a first semiconductor layer of non-doped AlXGa1-XN (0≦X
Public/Granted literature
- US20100230717A1 SEMICONDUCTOR DEVICE Public/Granted day:2010-09-16
Information query
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