Invention Grant
- Patent Title: Nitride semiconductor substrate
- Patent Title (中): 氮化物半导体衬底
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Application No.: US12530067Application Date: 2008-03-17
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Publication No.: US08237194B2Publication Date: 2012-08-07
- Inventor: Harumasa Yoshida , Yasufumi Takagi , Masakazu Kuwabara
- Applicant: Harumasa Yoshida , Yasufumi Takagi , Masakazu Kuwabara
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2007-075421 20070322
- International Application: PCT/JP2008/054864 WO 20080317
- International Announcement: WO2008/114772 WO 20080925
- Main IPC: H01L29/201
- IPC: H01L29/201

Abstract:
A nitride semiconductor substrate is featured in comprising: a GaN semiconductor layer grown on a base layer, which has a substantially triangular cross-section along the thickness direction thereof, a periodic stripe shapes, and uneven surfaces arranged on the stripes inclined surfaces; and an overgrown layer composed of AlGaN or InAlGaN on the GaN semiconductor layer.
Public/Granted literature
- US20100102328A1 NITRIDE SEMICONDUCTOR SUBSTRATE Public/Granted day:2010-04-29
Information query
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