Invention Grant
US08237047B2 Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product
失效
制造光刻装置或前基板的方法,用于与耐刮擦涂层和所得产品一起使用
- Patent Title: Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product
- Patent Title (中): 制造光刻装置或前基板的方法,用于与耐刮擦涂层和所得产品一起使用
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Application No.: US11797214Application Date: 2007-05-01
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Publication No.: US08237047B2Publication Date: 2012-08-07
- Inventor: Pramod K. Sharma
- Applicant: Pramod K. Sharma
- Applicant Address: US MI Auburn Hills
- Assignee: Guardian Industries Corp.
- Current Assignee: Guardian Industries Corp.
- Current Assignee Address: US MI Auburn Hills
- Agency: Nixon & Vanderhye P.C.
- Main IPC: H01L31/00
- IPC: H01L31/00 ; B05D5/12

Abstract:
A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst, and water; forming a silica sol gel by mixing the polymeric component with a colloidal silica, and optionally a second solvent; forming a combined sol by mixing siloxane(s) with the silica sol; casting the mixture by spin coating or the like to form a silica and siloxane containing layer on a substrate; and curing and/or heat treating the layer. This layer may make up all or only part of an anti-reflection coating which may be used in a photovoltaic device or the like.
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