Invention Grant
US08236688B2 Integrated circuit system with through silicon via and method of manufacture thereof 有权
具有硅通孔的集成电路系统及其制造方法

Integrated circuit system with through silicon via and method of manufacture thereof
Abstract:
A method of manufacture of an integrated circuit system includes: providing a substrate including an active device; forming a through-silicon-via into the substrate; forming an insulation layer over the through-silicon-via to protect the through-silicon-via; forming a contact to the active device after forming the insulation layer; and removing the insulation layer.
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