Invention Grant
- Patent Title: Phase change memory device having multiple metal silicide layers and method of manufacturing the same
- Patent Title (中): 具有多个金属硅化物层的相变存储器件及其制造方法
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Application No.: US12539160Application Date: 2009-08-11
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Publication No.: US08236685B2Publication Date: 2012-08-07
- Inventor: Nam Kyun Park
- Applicant: Nam Kyun Park
- Applicant Address: KR Kyoungki-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Kyoungki-do
- Agency: Ladas & Parry LLP
- Priority: KR10-2008-0091537 20080918
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00

Abstract:
A phase change memory device having multiple metal silicide layers which enhances the current driving capability of switching elements and a method of manufacturing the same are presented. The device also includes switching elements, heaters, stack patterns, top electrodes, bit lines, word line contacts and word lines. The bottom of the switching elements are in electrical contact with the lower metal silicide layer and with an active area of silicon substrate. An upper metal silicide layer is interfaced between the top of the switching elements and the heaters. The stack patterns include phase change layers and top electrodes and are between the heaters and the top electrodes are in electrical contact with the top electrodes. The bit lines contact with the top electrode contacts. The word line contacts to the lower metal silicide film.
Public/Granted literature
- US20100065804A1 PHASE CHANGE MEMORY DEVICE HAVING MULTIPLE METAL SILICIDE LAYERS AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-03-18
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