Invention Grant
US08236672B2 Semiconductor device and method for manufacturing semiconductor device 有权
半导体装置及半导体装置的制造方法

Semiconductor device and method for manufacturing semiconductor device
Abstract:
A cavity-containing layer having a plurality of cavities is formed on a growth substrate by carrying out in alternating fashion a plurality of cycles of a first and second growth steps of growing a group III nitride at growth rates different from each other. The semiconductor epitaxial layer is subsequently formed on the cavity-containing layer, after which a support substrate is bonded to the semiconductor epitaxial layer. The growth substrate is separated from the cavity-containing layer.
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