Invention Grant
- Patent Title: Method for manufacturing a multi-wavelength integrated semiconductor laser
- Patent Title (中): 多波长集成半导体激光器的制造方法
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Application No.: US12158648Application Date: 2006-12-14
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Publication No.: US08236588B2Publication Date: 2012-08-07
- Inventor: Mamoru Miyachi , Yoshinori Kimura
- Applicant: Mamoru Miyachi , Yoshinori Kimura
- Applicant Address: JP Tokyo
- Assignee: Pioneer Corporation
- Current Assignee: Pioneer Corporation
- Current Assignee Address: JP Tokyo
- Agency: Arent Fox LLP
- Priority: JP2005-366616 20051220
- International Application: PCT/JP2006/324924 WO 20061214
- International Announcement: WO2007/072726 WO 20070628
- Main IPC: H01S3/063
- IPC: H01S3/063

Abstract:
An object is to provide a multi-wavelength integrated semiconductor laser device which can reduce variations in emission point distance, can be formed by simplified manufacturing processes, and can provide improve electric characteristics.A first semiconductor laser element 100 having an active layer AL1 for emitting a laser beam of a first wavelength from its light-emitting point X1 and a second semiconductor laser element 200 having an active layer AL2 for emitting a laser beam of a second wavelength from its light-emitting point X2 are bonded to each other via an adhesive layer MC made of metal. At least either one of the semiconductor laser elements has a ridge waveguide made of an n-type semiconductor. The semiconductor laser elements 100 and 200 are bonded via the metal adhesive layer MC at the sides of their respective p-type semiconductors. A submount SUB is bonded to the first semiconductor laser element 100 via metal at a side where its ridge waveguide is formed.
Public/Granted literature
- US20090311815A1 MULTI-WAVELENGTH INTEGRATED SEMICONDUCTOR LASER DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2009-12-17
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