Invention Grant
US08236482B2 Photoresist compositions and methods of use in high index immersion lithography
失效
光刻胶组合物和高指数浸渍光刻中使用的方法
- Patent Title: Photoresist compositions and methods of use in high index immersion lithography
- Patent Title (中): 光刻胶组合物和高指数浸渍光刻中使用的方法
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Application No.: US12163649Application Date: 2008-06-27
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Publication No.: US08236482B2Publication Date: 2012-08-07
- Inventor: Hiroshi Ito , Daniel Paul Sanders , Linda Karin Sundberg
- Applicant: Hiroshi Ito , Daniel Paul Sanders , Linda Karin Sundberg
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: CanaanLaw, P.C.
- Agent Karen Canaan
- Main IPC: G03C1/00
- IPC: G03C1/00 ; G03F7/00 ; G03F1/00
Abstract:
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.
Public/Granted literature
- US20090181322A1 Photoresist Compositions and Methods of Use in High Index Immersion Lithography Public/Granted day:2009-07-16
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