Invention Grant
- Patent Title: Hybrid silicon wafer and method for manufacturing same
- Patent Title (中): 混合硅晶片及其制造方法
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Application No.: US13002928Application Date: 2009-06-23
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Publication No.: US08236428B2Publication Date: 2012-08-07
- Inventor: Kazuyuki Satoh , Yoshimasa Koido
- Applicant: Kazuyuki Satoh , Yoshimasa Koido
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2008-179988 20080710
- International Application: PCT/JP2009/061354 WO 20090623
- International Announcement: WO2010/004863 WO 20100114
- Main IPC: G11B11/105
- IPC: G11B11/105 ; B32B9/04 ; B32B13/04 ; B32B37/00 ; B32B38/04 ; B29C65/00

Abstract:
Provided is a hybrid silicon wafer comprising a structure in which a single-crystal wafer is embedded in a sintered polysilicon wafer. Also provided is a method for manufacturing a hybrid silicon wafer having a structure in which a single-crystal wafer is embedded in a sintered polysilicon wafer, wherein a part of the sintered polysilicon is hollowed, a single crystal ingot is inserted into the hollowed portion, these are mutually bonded through thermal diffusion bonding based on HIP to prepare a complex of the sintered polysilicon and the single-crystal silicon ingot, and the complex is sliced. Thereby provided are a hybrid silicon wafer comprising functions of both the polysilicon wafer and the single-crystal wafer, and a method for manufacturing such a hybrid silicon wafer.
Public/Granted literature
- US20110123795A1 Hybrid Silicon Wafer and Method for Manufacturing Same Public/Granted day:2011-05-26
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