Invention Grant
- Patent Title: Pressure-sensitive adhesive for optical films
- Patent Title (中): 用于光学膜的压敏粘合剂
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Application No.: US12312916Application Date: 2007-11-26
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Publication No.: US08236417B2Publication Date: 2012-08-07
- Inventor: Yoshihiro Morishita , Kenichi Hamada , Tetsuya Kunimune , Kazushige Ishiura
- Applicant: Yoshihiro Morishita , Kenichi Hamada , Tetsuya Kunimune , Kazushige Ishiura
- Applicant Address: JP Kurashiki-shi
- Assignee: Kuraray Co., Ltd.
- Current Assignee: Kuraray Co., Ltd.
- Current Assignee Address: JP Kurashiki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-325706 20061201
- International Application: PCT/JP2007/072728 WO 20071126
- International Announcement: WO2008/065982 WO 20080605
- Main IPC: C09J7/00
- IPC: C09J7/00 ; C08L53/00

Abstract:
A pressure-sensitive adhesive contains an acrylic triblock copolymer (I) at not less than 60% by mass based on the total mass of all solids contained in the pressure-sensitive adhesive, the acrylic triblock copolymer being represented by the formula A1-B-A2 wherein: A1 and A2 are each independently an alkyl methacrylate polymer block having Tg of not less than 100° C. and B is an acryl acrylate polymer block having Tg of not more than −20° C.; the content of the polymer block B is 50 to 95% by mass; Mw is in the range of 50,000 to 300,000; and the molecular weight distribution is in the range of 1.0 to 1.5. Preferably, the acrylic triblock copolymer (I) is a combination of an acrylic triblock copolymer (Ia) having Mw of 50,000 to less than 100,000 and an acrylic triblock copolymer (Ib) having Mw of 100,000 to 300,000, in a mass ratio (Ia):(Ib) of 45:55 to 75:25.
Public/Granted literature
- US20090305068A1 PRESSURE-SENSITIVE ADHESIVE FOR OPTICAL FILMS Public/Granted day:2009-12-10
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