Invention Grant
US08236381B2 Metal piperidinate and metal pyridinate precursors for thin film deposition
失效
金属哌啶和金属吡啶类前体用于薄膜沉积
- Patent Title: Metal piperidinate and metal pyridinate precursors for thin film deposition
- Patent Title (中): 金属哌啶和金属吡啶类前体用于薄膜沉积
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Application No.: US12538513Application Date: 2009-08-10
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Publication No.: US08236381B2Publication Date: 2012-08-07
- Inventor: Shingo Okubo
- Applicant: Shingo Okubo
- Applicant Address: FR Paris
- Assignee: L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee: L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
Methods and compositions for depositing a film on one or more substrates include providing a reactor and at least one substrate disposed in the reactor. At least one lanthanide precursor is provided in vapor form and a lanthanide metal thin film layer is deposited onto the substrate.
Public/Granted literature
- US20100034695A1 METAL PIPERIDINATE AND METAL PYRIDINATE PRECURSORS FOR THIN FILM DEPOSITION Public/Granted day:2010-02-11
Information query
IPC分类:
