Invention Grant
- Patent Title: Recast removal method
- Patent Title (中): 重磨去除方法
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Application No.: US12138710Application Date: 2008-06-13
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Publication No.: US08236190B2Publication Date: 2012-08-07
- Inventor: Michael J. Gehron , Henry M. Hodgens
- Applicant: Michael J. Gehron , Henry M. Hodgens
- Applicant Address: US CT Hartford
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Hartford
- Agency: Carlson, Gaskey & Olds, P.C.
- Main IPC: C03C15/00
- IPC: C03C15/00 ; C03C25/68 ; C25F3/00

Abstract:
A method of removing recast from a substrate is disclosed. The method includes chemically removing the recast using an etchant, which provides a visual indication of the presence of the recast when the part has been removed from the etchant. One example chemical etchant is comprised of a sulfuric acid solution that includes sodium chloride, sodium fluoride and ammonium persulfate. After chemical removal of the recast from the substrate, the recast is physically removed from the substrate, for example, by media blasting. The chemical and physical recast removal process can be repeated as desired. To ensure that all the recast has been removed, the substrate is wiped, for example, using a cloth. If all the recast has been removed, the cloth will not change in appearance or color.
Public/Granted literature
- US20090308761A1 RECAST REMOVAL METHOD Public/Granted day:2009-12-17
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