Invention Grant
- Patent Title: Anode media for use in electroplating processes, and methods of cleaning thereof
- Patent Title (中): 用于电镀工艺的阳极介质及其清洁方法
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Application No.: US12562756Application Date: 2009-09-18
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Publication No.: US08236163B2Publication Date: 2012-08-07
- Inventor: Balaji Rao Garimella , Supramaniam Suppiah , Davan Gassappan
- Applicant: Balaji Rao Garimella , Supramaniam Suppiah , Davan Gassappan
- Applicant Address: US CT Hartford
- Assignee: United Technologies Corporation
- Current Assignee: United Technologies Corporation
- Current Assignee Address: US CT Hartford
- Agency: Kinney & Lange, P.A.
- Main IPC: C25F3/16
- IPC: C25F3/16
Abstract:
A method for cleaning anode media, the method comprising removing the anode media from an electroplating system, and removing scale coatings from substrates of the anode media by vibrational polishing the anode media with abrasive particles.
Public/Granted literature
- US20110068010A1 ANODE MEDIA FOR USE IN ELECTROPLATING PROCESSES, AND METHODS OF CLEANING THEREOF Public/Granted day:2011-03-24
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