Invention Grant
- Patent Title: Gas distributor and apparatus using the same
- Patent Title (中): 气体分配器和使用其的设备
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Application No.: US11177883Application Date: 2005-07-08
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Publication No.: US08236134B2Publication Date: 2012-08-07
- Inventor: Ho-Chul Kang
- Applicant: Ho-Chul Kang
- Applicant Address: KR Gwangju-si, Gyeonggi-do
- Assignee: Jusung Engineering Co., Ltd.
- Current Assignee: Jusung Engineering Co., Ltd.
- Current Assignee Address: KR Gwangju-si, Gyeonggi-do
- Agent Hosoon Lee
- Priority: KR10-2004-0053641 20040709
- Main IPC: C23C16/455
- IPC: C23C16/455 ; H01L21/3065
Abstract:
A gas distributor for a plasma apparatus includes: a body having a plurality of injection holes, the body being divided into a lower portion and an upper portion with respect to a center surface; and a body supporting unit connected to the lower portion.
Public/Granted literature
- US20060005926A1 Gas distributor and apparatus using the same Public/Granted day:2006-01-12
Information query
IPC分类:
