Invention Grant
- Patent Title: Single-crystal manufacturing apparatus and single-crystal manufacturing method
- Patent Title (中): 单晶制造装置和单晶制造方法
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Application No.: US12991714Application Date: 2009-05-08
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Publication No.: US08236104B2Publication Date: 2012-08-07
- Inventor: Satoshi Soeta , Toshifumi Fujii
- Applicant: Satoshi Soeta , Toshifumi Fujii
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2008-172756 20080701
- International Application: PCT/JP2009/002018 WO 20090508
- International Announcement: WO2010/001519 WO 20100107
- Main IPC: C30B15/20
- IPC: C30B15/20

Abstract:
A single-crystal manufacturing apparatus comprising at least: a main chamber configured to accommodate a crucible; a pulling chamber continuously provided above the main chamber, the pulling chamber into which a grown single crystal is pulled and accommodated; a gas inlet provided in the pulling chamber; a gas flow-guide cylinder downwardly extending from a ceiling of the main chamber; and a heat-insulating ring upwardly extending from a lower end portion of the gas flow-guide cylinder with a diameter of the heat-insulating ring increased so as to surround an outside of the gas flow-guide cylinder, wherein at least one window is provided in a region between 50 and 200 mm from a lower end of the gas flow-guide cylinder, and an opening area of the window accounts for 50% or more of a surface area of the region between 50 and 200 mm from the lower end of the gas flow-guide cylinder.
Public/Granted literature
- US20110056427A1 SINGLE-CRYSTAL MANUFACTURING APPARATUS AND SINGLE-CRYSTAL MANUFACTURING METHOD Public/Granted day:2011-03-10
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