Invention Grant
- Patent Title: Probe polishing method, program therefor, and probe apparatus
- Patent Title (中): 探针抛光方法,程序和探针装置
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Application No.: US12545184Application Date: 2009-08-21
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Publication No.: US08195324B2Publication Date: 2012-06-05
- Inventor: Hideaki Tanaka , Satoshi Sano
- Applicant: Hideaki Tanaka , Satoshi Sano
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-216012 20080825
- Main IPC: B24B51/00
- IPC: B24B51/00 ; G06F11/30 ; G06F19/00

Abstract:
A probe polishing method is provided for polishing probes by brining a polishing member into slide-contact with probes through a mounting table having thereon the polishing member transferred from a first receiving part. The probe polishing method includes transferring the polishing member from the first receiving part to the mounting table; detecting a presence of foreign materials on a top surface of the polishing member mounted on the mounting table; transferring the polishing member from the mounting table to a second receiving part when the foreign materials are detected on the top surface of the polishing member; removing the foreign materials from the polishing member in the second receiving part; and transferring the polishing member from which the foreign materials are removed from the second receiving part to the first receiving part.
Public/Granted literature
- US20100048099A1 PROBE POLISHING METHOD, PROGRAM THEREFOR, AND PROBE APPARATUS Public/Granted day:2010-02-25
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