Invention Grant
- Patent Title: Nitride semiconductor laser device
- Patent Title (中): 氮化物半导体激光器件
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Application No.: US12470919Application Date: 2009-05-22
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Publication No.: US08194711B2Publication Date: 2012-06-05
- Inventor: Yoshiaki Hasegawa , Atsunori Mochida
- Applicant: Yoshiaki Hasegawa , Atsunori Mochida
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-187681 20080718
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride semiconductor laser device includes a multilayer structure including a plurality of nitride semiconductor layers including a light emitting layer, the multilayer structure having cavity facets facing each other, and a plurality of protective films made of a dielectric material provided on one of the cavity facets. The protective films include a first protective film, a second protective film and a third protective film. The first protective film contacts the cavity facet and is made of aluminum nitride. The second protective film is provided on a surface opposite to the cavity facet of the first protective film and is made of a material different from that of the first protective film. The third protective film is provided on a surface opposite to the first protective film of the second protective film and is made of the same material as that of the first protective film.
Public/Granted literature
- US20100014550A1 NITRIDE SEMICONDUCTOR LASER DEVICE Public/Granted day:2010-01-21
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