Invention Grant
US08194322B2 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror 有权
多层膜反射镜,曝光装置,器件制造方法以及多层膜反射镜的制造方法

  • Patent Title: Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
  • Patent Title (中): 多层膜反射镜,曝光装置,器件制造方法以及多层膜反射镜的制造方法
  • Application No.: US12074903
    Application Date: 2008-03-07
  • Publication No.: US08194322B2
    Publication Date: 2012-06-05
  • Inventor: Masayuki Shiraishi
  • Applicant: Masayuki Shiraishi
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Klarquist Sparkman, LLP
  • Main IPC: G02B1/10
  • IPC: G02B1/10
Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
Abstract:
Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
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