Invention Grant
- Patent Title: Dynamic fluid control system for immersion lithography
- Patent Title (中): 用于浸没式光刻的动态流体控制系统
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Application No.: US12222421Application Date: 2008-08-08
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Publication No.: US08194229B2Publication Date: 2012-06-05
- Inventor: Michael Sogard
- Applicant: Michael Sogard
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42

Abstract:
An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
Public/Granted literature
- US20080309895A1 Dynamic fluid control system for immersion lithography Public/Granted day:2008-12-18
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