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US08194229B2 Dynamic fluid control system for immersion lithography 有权
用于浸没式光刻的动态流体控制系统

Dynamic fluid control system for immersion lithography
Abstract:
An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
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