Invention Grant
US08193575B2 Flash memory structure with enhanced capacitive coupling coefficient ratio (CCCR) and method for fabrication thereof
失效
具有增强的电容耦合系数比(CCCR)的闪存结构及其制造方法
- Patent Title: Flash memory structure with enhanced capacitive coupling coefficient ratio (CCCR) and method for fabrication thereof
- Patent Title (中): 具有增强的电容耦合系数比(CCCR)的闪存结构及其制造方法
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Application No.: US12027496Application Date: 2008-02-07
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Publication No.: US08193575B2Publication Date: 2012-06-05
- Inventor: Louis C. Hsu , Xu Ouyang , Ping-Chuan Wang , Zhijian J. Yang
- Applicant: Louis C. Hsu , Xu Ouyang , Ping-Chuan Wang , Zhijian J. Yang
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent H. Daniel Schnurmann
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A flash memory structure having an enhanced capacitive coupling coefficient ratio (CCCR) may be fabricated in a self-aligned manner while using a semiconductor substrate that has an active region that is recessed within an aperture with respect to an isolation region that surrounds the active region. The flash memory structure includes a floating gate that does not rise above the isolation region, and that preferably consists of a single layer that has a U shape. The U shape facilitates the enhanced capacitive coupling coefficient ratio.
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