Invention Grant
- Patent Title: Monochromatic light source with high aspect ratio
- Patent Title (中): 具有高纵横比的单色光源
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Application No.: US13058315Application Date: 2009-08-18
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Publication No.: US08193543B2Publication Date: 2012-06-05
- Inventor: Catherine A. Leatherdale , Michael A. Haase , Todd A. Ballen
- Applicant: Catherine A. Leatherdale , Michael A. Haase , Todd A. Ballen
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Kristofor L. Storvick
- International Application: PCT/US2009/054145 WO 20090818
- International Announcement: WO2010/027649 WO 20100311
- Main IPC: H01L27/15
- IPC: H01L27/15

Abstract:
Light emitting systems are disclosed. The light emitting system includes an LED that emits light at a first wave-length. A primary portion of the emitted first wavelength light exits the LED from a top surface of the LED that has a minimum lateral dimension Wmin. The remaining portion of the emitted first wavelength light exits the LED from one or more sides of the LED that has a maximum edge thickness Tmax (122, 124). The ratio Wmin/Tmax is at least 30. The light emitting system further includes a re-emitting semiconductor construction that includes a semiconductor potential well. The re-emitting semiconductor construction receives the first wavelength light that exits the LED from the top surface and converts at least a portion of the received light to light of a second wavelength. The integrated emission intensity of all light at the second wavelength that exit the light emitting system is at least 4 times the integrated emission intensity of all light at the first wavelength that exit the light emitting system.
Public/Granted literature
- US20110140128A1 MONOCHROMATIC LIGHT SOURCE WITH HIGH ASPECT RATIO Public/Granted day:2011-06-16
Information query
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