Invention Grant
- Patent Title: Transistor having an organic semiconductor with a hollow space
- Patent Title (中): 具有中空空间的有机半导体的晶体管
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Application No.: US12672135Application Date: 2008-08-06
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Publication No.: US08193526B2Publication Date: 2012-06-05
- Inventor: Seiichi Nakatani , Yoshihisa Yamashita , Takashi Kitae , Susumu Sawada
- Applicant: Seiichi Nakatani , Yoshihisa Yamashita , Takashi Kitae , Susumu Sawada
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-205202 20070807
- International Application: PCT/JP2008/002123 WO 20080806
- International Announcement: WO2009/019864 WO 20090212
- Main IPC: H01L51/00
- IPC: H01L51/00

Abstract:
A semiconductor device having a semiconductor elements formed with higher density is provided. Furthermore an image display device using the semiconductor device is also provided.A semiconductor device comprising a resin film that has a through hole that penetrates from one surface to the other surface thereof, a source electrode disposed along the inner wall of the through hole, a drain electrode disposed along the inner wall of the through hole, a gate electrode disposed on the other surface of the resin film opposing the through hole, an insulating layer disposed on the gate electrode at the bottom of the through hole and an organic semiconductor disposed in the through hole so as to contact the source electrode and the drain electrode, wherein the organic semiconductor makes contact with at least a part of the insulating layer at the bottom of the through hole so that a channel is formed in the organic semiconductor in the vicinity of the insulating layer that is in contact therewith.
Public/Granted literature
- US20110204367A1 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME AND IMAGE DISPLAY Public/Granted day:2011-08-25
Information query
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