Invention Grant
- Patent Title: Surface enhanced infrared absorption sensor and method for producing the same
- Patent Title (中): 表面增强红外吸收传感器及其制造方法
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Application No.: US12676723Application Date: 2008-09-05
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Publication No.: US08193499B2Publication Date: 2012-06-05
- Inventor: Tadaaki Nagao , Dominik Enders , Tomonobu Nakayama , Masakazu Aono
- Applicant: Tadaaki Nagao , Dominik Enders , Tomonobu Nakayama , Masakazu Aono
- Applicant Address: JP Ibaraki
- Assignee: National Institute for Materials Science
- Current Assignee: National Institute for Materials Science
- Current Assignee Address: JP Ibaraki
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-233049 20070907
- International Application: PCT/JP2008/066107 WO 20080905
- International Announcement: WO2009/031662 WO 20090312
- Main IPC: G01J5/58
- IPC: G01J5/58

Abstract:
The method for producing a surface enhanced infrared absorption sensor of the invention is characterized by: adsorbing metallic nanoparticles dispersed in a solution on a surface of a substrate, or allowing the adsorbed metallic nanoparticles to be grown in a solution, thereby forming a film; applying infrared light to the substrate from the side thereof opposite to the side on which the metallic nano-thin film is disposed; detecting evanescent waves exuding from the substrate; and regulating a surface enhanced infrared adsorption activity while monitoring surface enhanced infrared adsorption signals in situ, whereby the metallic nano-thin film is grown in the form of flat and discontinuous islands. According to the method, there is provided a production technique for a surface enhanced infrared absorption (SEIRA) sensor having a higher sensitivity and more excellent in the reproducibility.
Public/Granted literature
- US20100239821A1 SURFACE ENHANCED INFRARED ABSORPTION SENSOR AND METHOD FOR PRODUCING THE SAME Public/Granted day:2010-09-23
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