Invention Grant
US08193075B2 Remote hydrogen plasma with ion filter for terminating silicon dangling bonds
有权
具有离子过滤器的远程氢等离子体，用于终止硅悬挂键
- Patent Title: Remote hydrogen plasma with ion filter for terminating silicon dangling bonds
- Patent Title (中): 具有离子过滤器的远程氢等离子体，用于终止硅悬挂键
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Application No.: US12757341Application Date: 2010-04-09
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Publication No.: US08193075B2Publication Date: 2012-06-05
- Inventor: Zhi Xu
- Applicant: Zhi Xu
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Diehl Servilla LLC
- Main IPC: H01L21/322
- IPC: H01L21/322
Abstract:
Apparatus and methods for repairing silicon dangling bonds resulting from semiconductor processing are disclosed. The silicon dangling bonds can be repaired by introducing hydrogen radicals with substantially no hydrogen ions into the processing chamber to react with the silicon dangling bonds, eliminating them.
Public/Granted literature
- US20110008950A1 Remote Hydrogen Plasma With Ion Filter for Terminating Silicon Dangling Bonds Public/Granted day:2011-01-13
Information query
IPC分类:
