Invention Grant
US08192917B2 Material for multiphoton fluorescence microscope and multiphoton fluorescence microscope
失效
光敏复合材料,三维记忆材料和记录介质,光学功率限制材料和元素,光固化材料和立体光刻系统,以及用于多光子荧光显微镜和多光子荧光显微镜的荧光材料
- Patent Title: Material for multiphoton fluorescence microscope and multiphoton fluorescence microscope
- Patent Title (中): 光敏复合材料,三维记忆材料和记录介质,光学功率限制材料和元素,光固化材料和立体光刻系统,以及用于多光子荧光显微镜和多光子荧光显微镜的荧光材料
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Application No.: US12441490Application Date: 2008-06-12
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Publication No.: US08192917B2Publication Date: 2012-06-05
- Inventor: Tatsuya Tomura , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Masaomi Sasaki
- Applicant: Tatsuya Tomura , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Masaomi Sasaki
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-170598 20070628
- International Application: PCT/JP2008/061177 WO 20080612
- International Announcement: WO2009/001736 WO 20081231
- Main IPC: G11B7/24
- IPC: G11B7/24 ; G09B67/44 ; B22F9/24 ; C09B23/00

Abstract:
A photosensitized composite material and a material, an element, a device, and the like, which employ the photosensitized composite material, are provided. In the photosensitized composite material, multiphoton absorption compounds are highly sensitized for practical use by utilizing an enhanced plasmon field. The photosensitized composite material has a structure where the multiphoton absorption compounds are linked to the surface of a fine metal particle through linking groups. The fine metal particle generates an enhanced surface plasmon field in resonance with a multiphoton excitation wavelength. The multiphoton absorption compounds have a molecular structure enabling multiphoton absorption. The photosensitized composite material is contained in or used for, for example, a three-dimensional memory material and a three-dimensional recording medium, an optical power limiting material and an optical power limiting element, a photocuring material and a stereolithography system, and a fluorescent material for a multiphoton fluorescence microscope and a multiphoton fluorescence microscope.
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