Invention Grant
- Patent Title: Pellicle for photolithography
- Patent Title (中): 光刻薄膜
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Application No.: US12656207Application Date: 2010-01-21
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Publication No.: US08192899B2Publication Date: 2012-06-05
- Inventor: Yoshihiko Nagata
- Applicant: Yoshihiko Nagata
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2009-015390 20090127
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/62
Abstract:
There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which the air vents in the frame are counterbored and a counterbored wall surface of the air vents is tapered.
Public/Granted literature
- US20100190097A1 Pellicle for photolithography Public/Granted day:2010-07-29
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