Invention Grant
- Patent Title: Massively parallel lithography with two-dimensional pen arrays
- Patent Title (中): 大尺寸平行光刻与二维笔阵列
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Application No.: US12000456Application Date: 2007-12-12
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Publication No.: US08192794B2Publication Date: 2012-06-05
- Inventor: Chad A. Mirkin , Peng Sun , Yuhuang Wang , Steven Lenhert
- Applicant: Chad A. Mirkin , Peng Sun , Yuhuang Wang , Steven Lenhert
- Applicant Address: US IL Evanston DE Karlsruhe
- Assignee: Northwestern University,Karlsruhe Institute of Technology
- Current Assignee: Northwestern University,Karlsruhe Institute of Technology
- Current Assignee Address: US IL Evanston DE Karlsruhe
- Agency: Foley & Lardner LLP
- Main IPC: B05D5/00
- IPC: B05D5/00 ; G01N1/28

Abstract:
Massive parallel printing of structures and nanostructures, including lipids, at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The invention provides a nanolithographic method comprising (1) providing a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers extending from the base row, wherein each of the cantilevers comprising tips at the cantilever end away from the base row; wherein the two dimensional array has a support; (2) providing a patterning composition, wherein the composition comprises one or more lipids; (3) providing a substrate; (4) coating the tips of the cantilevers with the patterning composition; and (5) depositing at least some of the patterning composition from the tips to the substrate surface.
Public/Granted literature
- US20090325816A1 Massively parallel lithography with two-dimensional pen arrays Public/Granted day:2009-12-31
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