Invention Grant
- Patent Title: Thermally isolated cryopanel for vacuum deposition systems
- Patent Title (中): 用于真空沉积系统的隔热冷冻板
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Application No.: US11903727Application Date: 2007-09-24
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Publication No.: US08192547B2Publication Date: 2012-06-05
- Inventor: David William Gotthold , Richard Charles Bresnahan , Scott Wayne Priddy , Mark Lee O'Steen
- Applicant: David William Gotthold , Richard Charles Bresnahan , Scott Wayne Priddy , Mark Lee O'Steen
- Applicant Address: US NY Woodbury
- Assignee: Veeco Instruments Inc.
- Current Assignee: Veeco Instruments Inc.
- Current Assignee Address: US NY Woodbury
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy.
Public/Granted literature
- US20080134975A1 Thermally isolated cryopanel for vacuum deposition systems Public/Granted day:2008-06-12
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