Invention Grant
US08192546B2 Deposition apparatus 有权
沉积装置

Deposition apparatus
Abstract:
A deposition apparatus including: a chamber; a mask assembly including a mask arranged to deposit a material on a substrate included in the chamber and a mask frame for supporting the mask; and a magnet unit including a first magnet unit which contacts (or adheres or chucks or secures) the mask assembly to the substrate by magnetic force; and a second magnet unit corresponding to the mask frame, in order to ensure that the mask more closely contacts the substrate.
Public/Granted literature
Information query
Patent Agency Ranking
0/0