Invention Grant
- Patent Title: Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
- Patent Title (中): 成膜装置，薄膜形成方法以及光电转换装置的制造方法
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Application No.: US13154503Application Date: 2011-06-07
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Publication No.: US08192545B2Publication Date: 2012-06-05
- Inventor: Yoshikazu Hiura , Hiroki Adachi , Hironobu Takahashi , Yuusuke Sugawara , Tatsuya Arao , Kazuo Nishi , Yasuyuki Arai
- Applicant: Yoshikazu Hiura , Hiroki Adachi , Hironobu Takahashi , Yuusuke Sugawara , Tatsuya Arao , Kazuo Nishi , Yasuyuki Arai
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2005-279117 20050927
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/50 ; C23C16/458
Abstract:
The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit provided in a portion where the substrate comes in and out in the buffer chamber, and a second transfer chamber having a roller for rewinding the substrate. The slit is provided with at least one touch roller, and the touch roller is in contact with a film formation surface of the substrate. In addition, the present invention also relates to a method for forming a film and a method for manufacturing a photoelectric conversion device that are performed by using such a film formation apparatus.
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