Invention Grant
- Patent Title: Method of producing magnetoresistance effect element
- Patent Title (中): 制造磁阻效应元件的方法
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Application No.: US12340236Application Date: 2008-12-19
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Publication No.: US08191235B2Publication Date: 2012-06-05
- Inventor: Migaku Takahashi , Masakiyo Tsunoda , Koujiro Komagaki , Yuji Uehara , Kazuyuki Sunaga
- Applicant: Migaku Takahashi , Masakiyo Tsunoda , Koujiro Komagaki , Yuji Uehara , Kazuyuki Sunaga
- Applicant Address: JP Kawasaki JP Sendai
- Assignee: Fujitsu Limited,Tohoku University
- Current Assignee: Fujitsu Limited,Tohoku University
- Current Assignee Address: JP Kawasaki JP Sendai
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2007-340648 20071228
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
The method of the present invention provides a magnetoresistance effect element, which is capable of having a high MR ratio, corresponding to high density recording and being suitably applied to a magnetoresistance device even though a barrier layer is thinned to reduce resistance of the magnetoresistance effect element. The method of producing the magnetoresistance effect element, which includes the barrier layer composed of an oxidized metal, a first magnetic layer contacting one of surfaces of the barrier layer and a second magnetic layer contacting the other surface thereof, comprises the steps of: laminating the barrier layer on the first magnetic layer with using a target composed of the oxidized metal; and laminating the second magnetic layer on the barrier layer. The barrier layer is annealed before laminating the second magnetic layer thereon.
Public/Granted literature
- US20090169915A1 METHOD OF PRODUCING MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2009-07-02
Information query
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