Invention Grant
- Patent Title: Method for dimension conversion difference prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for dimension conversion difference prediction
- Patent Title (中): 尺寸转换差分预测方法，光掩模制造方法，电子元件制造方法，尺寸转换差分预测程序
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Application No.: US12238018Application Date: 2008-09-25
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Publication No.: US08171434B2Publication Date: 2012-05-01
- Inventor: Katsumi Iyanagi
- Applicant: Katsumi Iyanagi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-250221 20070926
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method for dimension conversion difference prediction includes: determining an opening angle at a conversion difference prediction point on basis of a design pattern data; and predicting a dimension conversion difference on basis of correlation between the opening angle and an actual measurement value of the dimension conversion difference, or a method for dimension conversion difference prediction includes: determining an incident amount of incident objects at a conversion difference prediction point on basis of a design data; and predicting a dimension conversion difference on basis of correlation between the incident amount and an actual measurement value of the dimension conversion difference.
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