Invention Grant
- Patent Title: Electrode structure, semiconductor element, and methods of manufacturing the same
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Application No.: US12519698Application Date: 2007-12-11
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Publication No.: US08169078B2Publication Date: 2012-05-01
- Inventor: Shigeru Koumoto , Tatsuya Sasaki , Kazuhiro Shiba , Masayoshi Sumino
- Applicant: Shigeru Koumoto , Tatsuya Sasaki , Kazuhiro Shiba , Masayoshi Sumino
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-354091 20061228
- International Application: PCT/JP2007/001381 WO 20071211
- International Announcement: WO2008/081566 WO 20080710
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Nb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
Public/Granted literature
- US20100032839A1 ELECTRODE STRUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2010-02-11
Information query
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