Invention Grant
- Patent Title: Semiconductor device comprising a schottky barrier diode
- Patent Title (中): 包括肖特基势垒二极管的半导体器件
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Application No.: US12205622Application Date: 2008-09-05
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Publication No.: US08169047B2Publication Date: 2012-05-01
- Inventor: Kunihiko Kato , Hideki Yasuoka , Masatoshi Taya , Masami Koketsu
- Applicant: Kunihiko Kato , Hideki Yasuoka , Masatoshi Taya , Masami Koketsu
- Applicant Address: JP Kawasaki-shi
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Miles & Stockbridge P.C.
- Priority: JP2007-231849 20070906
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
The present invention aims to enhance the reliability of a semiconductor device equipped with a Schottky barrier diode within the same chip, and its manufacturing technology. The semiconductor device includes an n-type n-well region formed over a p-type semiconductor substrate, an n-type cathode region formed in part thereof and higher in impurity concentration than the n-well region, a p-type guard ring region formed so as to surround the n-type cathode region, an anode conductor film formed so as to integrally cover the n-type cathode region and the p-type guard ring region and to be electrically coupled thereto, n-type cathode conduction regions formed outside the p-type guard ring region with each separation portion left therebetween, and a cathode conductor film formed so as to cover the n-type cathode conduction regions and to be electrically coupled thereto. The anode conductor film and the n-type cathode region are Schottky-coupled to each other.
Public/Granted literature
- US20090065888A1 SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-03-12
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